Title:
Advances in CMP/polishing technologies for the manufacture of electronic devices
Author:
Doi, Toshiro.
ISBN:
9781437778595
Edition:
1st ed.
Publication Information:
Oxford : William Andrew, 2012.
Physical Description:
1 online resource (xii, 317 pages)
General Note:
Includes index.
Abstract:
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R & D accessible to the wider engineering community.
Electronic Access:
ScienceDirect http://www.sciencedirect.com/science/book/9781437778595Available:*
Library | Material Type | Item Barcode | Shelf Number | Status |
---|---|---|---|---|
Searching... | E-Book | 198830-1001 | TS670 .A386 2012 eb | Searching... |